Space-divided plasma chemical vapor deposition (SDP-CVD)

[Serial No. 2012-G-023]

Jusung Engineering is a leading process equipment technology provider for the semiconductor, flat panel display, solar cell, and lighting industries. Since its founding in 1995, Jusung’s innovations enable customers and partners to produce advanced technology products while maintaining cost competitiveness and shortening time to market.

SDP-CVDhttps://korean-electronics.com//inquiry Developed by Jusung Engineering, SDPCVD (Space Divided Plasma Chemical Vapor Deposition) is considered to be one of the most advanced and promising technologies as the system can handle all of the deposition processes by PECVD, LPCVD and ALD.

In combination with new-concept plasma technology, the SDPCVD provides improved productivity up to twice that of PECVD and LPCVD. It is an innovative system designed to manage quality film coating even the temperature is below 400°C by maximizing the merits of the ALD system and tackling the PECVD system’s drawback of wafer damage from plasma.

 
 
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