[INQ. NO. 1911E29] New Power Plasma Co., Ltd. is a company specializing in developing power units and plasma sources based on original technical prowess. They are concentrating on technology development with a firm aim to conquer the global market.
They were also selected as one of the Top 10 New Technologies of Korea, and as a company producing world-class products through domestication of an RF generator (plasma power supply), a core part of plasma used in wafer, and LCD surface processing in the semiconductor, LCD and OLED industry, a matching network (impedance matching), and a remote plasma cleaning generator (cleaning residues in a chamber, RPG).
In particular, New Power Plasma is competing with global companies including ones in the United States by becoming the world’s second company localizing RPG products. And it continuously maintains its development every year based on ingenious technical prowess.
The RF generator is a device supplying high-frequency power to a process chamber so as to form process plasma all process devices (CVDs, Dry Etchers, etc.) which are essential to the manufacture of LCDs. It is a converter device that receives AC power source of 3-phase 220V, 400V, 440V, or 480V of the commercial power supply generally supplied in LCD manufacturing factories, and usually converts it to a higher frequency of 13.56MHz or above. It is used as an RF power source.
The RF generator has a lot of advantages. It is suitable for full digital control-based 13.56MHz/3kW level LCD processes. It increases the quick-response control by applying a recent power conversion platform and improves the system power conversion efficiency up to 83%.
Precise low power is consumed by controlling the 13.56MHz phase shift. It realizes various RF output behavior modes and quick responsiveness. It also realizes an intuitive Arc function and high-speed response (within 5 μs). The RF Generator secures RF output stability for the load and cable length changes by applying a 90° hybrid combiner.
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